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Science Journal of Circuits, Systems and Signal Processing

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Volume 3, Issue 4, August 2014

Fault Reduction in Nonoscale VLSI Interconnection by Using Carbon Nanotubes Technology

Behzad Lotfy, Houshang Salehi

Issue: Volume 3, Issue 4, August 2014

Pages: 26-30

Received: 1 September 2014

Accepted: 25 October 2014

Published: 28 November 2014

DOI: 10.11648/j.cssp.20140304.11

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Abstract: As the VLSI technology scales down, significant challenges are facing the fabrication, modeling, and performance of the integrated circuits. One of the major challenges for the continuiation of the Moore’s law is “interconnects” at nano-scale. Interconnects become as important as transistors in the current technologies and will dominate the chip pe... Show More

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