Metal Nanowires Subjected to Relavant Hydrated Metal Ions

Aiman Mukhtar; Tahir Mehmood

doi:doi:10.11648/j.ijmsa.20170602.14

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Metal Nanowires Subjected to Relavant Hydrated Metal Ions

Aiman Mukhtar, Tahir Mehmood

Published in International Journal of Materials Science and Applications (Volume 6, Issue 2)

Received: 9 February 2017 Published: 10 February 2017

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Abstract

The hcp-Co and fcc-Ni nanowires with the diameter of ~ 50nm were successfully prepared at different overpotentials by using potentiostatic electrochemical deposition in the pores of AAO templates. The prepared nanowires were characterized by X-ray diffraction, and the morphology of the nanowires was investigated by scanning electron microscope. In this study a new way is established to understand the growth rate of nanowires. The effect of work function on the growth rate of Co and Ni nanowires having same electrolyte’s concentration, same pH value, and same overpotentials, has been discussed. The growth rate of metal nanowires in ECD is determined by the tunneling current between a metal and hydrated metal ions. The higher the tunneling current, the higher will be the growth rate. The tunneling current probably relates to the work function of metal. The larger is the value of work function the lower is the probability of electron tunneling. Lowering the work function causes increase in the current density. The hydrated Co and Ni ions are of octahedral structure with M-O distance of 2.08 Å and 2.05 Å, respectively. The work function of Co is smaller, this lead to higher tunneling current density. Therefore, the measured current density is higher for Co than for Ni and the Co nanowires grow faster than that of the Ni nanowires.

Published in	International Journal of Materials Science and Applications (Volume 6, Issue 2)
DOI	10.11648/j.ijmsa.20170602.14
Page(s)	88-94
Creative Commons	This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.
Copyright	Copyright © The Author(s), 2017. Published by Science Publishing Group

Keywords

Crystal Structure, Nucleation, Growth from Solutions, Deposition Parameters

References

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Aiman Mukhtar, Tahir Mehmood. (2017). Metal Nanowires Subjected to Relavant Hydrated Metal Ions. International Journal of Materials Science and Applications, 6(2), 88-94. https://doi.org/10.11648/j.ijmsa.20170602.14

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Aiman Mukhtar; Tahir Mehmood. Metal Nanowires Subjected to Relavant Hydrated Metal Ions. Int. J. Mater. Sci. Appl. 2017, 6(2), 88-94. doi: 10.11648/j.ijmsa.20170602.14

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AMA Style

Aiman Mukhtar, Tahir Mehmood. Metal Nanowires Subjected to Relavant Hydrated Metal Ions. Int J Mater Sci Appl. 2017;6(2):88-94. doi: 10.11648/j.ijmsa.20170602.14

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@article{10.11648/j.ijmsa.20170602.14,
  author = {Aiman Mukhtar and Tahir Mehmood},
  title = {Metal Nanowires Subjected to Relavant Hydrated Metal Ions},
  journal = {International Journal of Materials Science and Applications},
  volume = {6},
  number = {2},
  pages = {88-94},
  doi = {10.11648/j.ijmsa.20170602.14},
  url = {https://doi.org/10.11648/j.ijmsa.20170602.14},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ijmsa.20170602.14},
  abstract = {The hcp-Co and fcc-Ni nanowires with the diameter of ~ 50nm were successfully prepared at different overpotentials by using potentiostatic electrochemical deposition in the pores of AAO templates. The prepared nanowires were characterized by X-ray diffraction, and the morphology of the nanowires was investigated by scanning electron microscope. In this study a new way is established to understand the growth rate of nanowires. The effect of work function on the growth rate of Co and Ni nanowires having same electrolyte’s concentration, same pH value, and same overpotentials, has been discussed. The growth rate of metal nanowires in ECD is determined by the tunneling current between a metal and hydrated metal ions. The higher the tunneling current, the higher will be the growth rate. The tunneling current probably relates to the work function of metal. The larger is the value of work function the lower is the probability of electron tunneling. Lowering the work function causes increase in the current density. The hydrated Co and Ni ions are of octahedral structure with M-O distance of 2.08 Å and 2.05 Å, respectively. The work function of Co is smaller, this lead to higher tunneling current density. Therefore, the measured current density is higher for Co than for Ni and the Co nanowires grow faster than that of the Ni nanowires.},
 year = {2017}
}

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TY  - JOUR
T1  - Metal Nanowires Subjected to Relavant Hydrated Metal Ions
AU  - Aiman Mukhtar
AU  - Tahir Mehmood
Y1  - 2017/02/10
PY  - 2017
N1  - https://doi.org/10.11648/j.ijmsa.20170602.14
DO  - 10.11648/j.ijmsa.20170602.14
T2  - International Journal of Materials Science and Applications
JF  - International Journal of Materials Science and Applications
JO  - International Journal of Materials Science and Applications
SP  - 88
EP  - 94
PB  - Science Publishing Group
SN  - 2327-2643
UR  - https://doi.org/10.11648/j.ijmsa.20170602.14
AB  - The hcp-Co and fcc-Ni nanowires with the diameter of ~ 50nm were successfully prepared at different overpotentials by using potentiostatic electrochemical deposition in the pores of AAO templates. The prepared nanowires were characterized by X-ray diffraction, and the morphology of the nanowires was investigated by scanning electron microscope. In this study a new way is established to understand the growth rate of nanowires. The effect of work function on the growth rate of Co and Ni nanowires having same electrolyte’s concentration, same pH value, and same overpotentials, has been discussed. The growth rate of metal nanowires in ECD is determined by the tunneling current between a metal and hydrated metal ions. The higher the tunneling current, the higher will be the growth rate. The tunneling current probably relates to the work function of metal. The larger is the value of work function the lower is the probability of electron tunneling. Lowering the work function causes increase in the current density. The hydrated Co and Ni ions are of octahedral structure with M-O distance of 2.08 Å and 2.05 Å, respectively. The work function of Co is smaller, this lead to higher tunneling current density. Therefore, the measured current density is higher for Co than for Ni and the Co nanowires grow faster than that of the Ni nanowires.
VL  - 6
IS  - 2
ER  -

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Author Information

Aiman Mukhtar

The State Key Laboratory of Refractories and Metallurgy, Hubei Collaborative Innovation Center for Advanced Steels, International Research Institute for Steel Technology, Wuhan University of Science and Technology, Wuhan, P. R. China
Tahir Mehmood

The State Key Laboratory of Refractories and Metallurgy, Hubei Collaborative Innovation Center for Advanced Steels, International Research Institute for Steel Technology, Wuhan University of Science and Technology, Wuhan, P. R. China

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APA Style

Aiman Mukhtar, Tahir Mehmood. (2017). Metal Nanowires Subjected to Relavant Hydrated Metal Ions. International Journal of Materials Science and Applications, 6(2), 88-94. https://doi.org/10.11648/j.ijmsa.20170602.14

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ACS Style

Aiman Mukhtar; Tahir Mehmood. Metal Nanowires Subjected to Relavant Hydrated Metal Ions. Int. J. Mater. Sci. Appl. 2017, 6(2), 88-94. doi: 10.11648/j.ijmsa.20170602.14

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AMA Style

Aiman Mukhtar, Tahir Mehmood. Metal Nanowires Subjected to Relavant Hydrated Metal Ions. Int J Mater Sci Appl. 2017;6(2):88-94. doi: 10.11648/j.ijmsa.20170602.14

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@article{10.11648/j.ijmsa.20170602.14,
  author = {Aiman Mukhtar and Tahir Mehmood},
  title = {Metal Nanowires Subjected to Relavant Hydrated Metal Ions},
  journal = {International Journal of Materials Science and Applications},
  volume = {6},
  number = {2},
  pages = {88-94},
  doi = {10.11648/j.ijmsa.20170602.14},
  url = {https://doi.org/10.11648/j.ijmsa.20170602.14},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ijmsa.20170602.14},
  abstract = {The hcp-Co and fcc-Ni nanowires with the diameter of ~ 50nm were successfully prepared at different overpotentials by using potentiostatic electrochemical deposition in the pores of AAO templates. The prepared nanowires were characterized by X-ray diffraction, and the morphology of the nanowires was investigated by scanning electron microscope. In this study a new way is established to understand the growth rate of nanowires. The effect of work function on the growth rate of Co and Ni nanowires having same electrolyte’s concentration, same pH value, and same overpotentials, has been discussed. The growth rate of metal nanowires in ECD is determined by the tunneling current between a metal and hydrated metal ions. The higher the tunneling current, the higher will be the growth rate. The tunneling current probably relates to the work function of metal. The larger is the value of work function the lower is the probability of electron tunneling. Lowering the work function causes increase in the current density. The hydrated Co and Ni ions are of octahedral structure with M-O distance of 2.08 Å and 2.05 Å, respectively. The work function of Co is smaller, this lead to higher tunneling current density. Therefore, the measured current density is higher for Co than for Ni and the Co nanowires grow faster than that of the Ni nanowires.},
 year = {2017}
}

Copy | Download

TY  - JOUR
T1  - Metal Nanowires Subjected to Relavant Hydrated Metal Ions
AU  - Aiman Mukhtar
AU  - Tahir Mehmood
Y1  - 2017/02/10
PY  - 2017
N1  - https://doi.org/10.11648/j.ijmsa.20170602.14
DO  - 10.11648/j.ijmsa.20170602.14
T2  - International Journal of Materials Science and Applications
JF  - International Journal of Materials Science and Applications
JO  - International Journal of Materials Science and Applications
SP  - 88
EP  - 94
PB  - Science Publishing Group
SN  - 2327-2643
UR  - https://doi.org/10.11648/j.ijmsa.20170602.14
AB  - The hcp-Co and fcc-Ni nanowires with the diameter of ~ 50nm were successfully prepared at different overpotentials by using potentiostatic electrochemical deposition in the pores of AAO templates. The prepared nanowires were characterized by X-ray diffraction, and the morphology of the nanowires was investigated by scanning electron microscope. In this study a new way is established to understand the growth rate of nanowires. The effect of work function on the growth rate of Co and Ni nanowires having same electrolyte’s concentration, same pH value, and same overpotentials, has been discussed. The growth rate of metal nanowires in ECD is determined by the tunneling current between a metal and hydrated metal ions. The higher the tunneling current, the higher will be the growth rate. The tunneling current probably relates to the work function of metal. The larger is the value of work function the lower is the probability of electron tunneling. Lowering the work function causes increase in the current density. The hydrated Co and Ni ions are of octahedral structure with M-O distance of 2.08 Å and 2.05 Å, respectively. The work function of Co is smaller, this lead to higher tunneling current density. Therefore, the measured current density is higher for Co than for Ni and the Co nanowires grow faster than that of the Ni nanowires.
VL  - 6
IS  - 2
ER  -

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